Angolan has enacted no specific rules on protection of mask works or topographies. Although Angola is part of the WTO and has approved the TRIPS Agreement, it has not yet implemented any rules on mask works or topographies protection.

Semiconductor technology, generally, and topographies, in particular, may be protected under the traditional intellectual property rules applicable to all types of technology, particularly patent law and the rules on confidential information. Therefore, matters such as the duration of the relevant rights, ownership and remedies depend on the type of protection used in connection with each specific mask work or topography.

Argentina has enacted no specific rules on chip protection. Although Argentina is part of the WTO and has approved the Trips Agreement, it has not yet implemented any rules on chip protection.

The provisions on chip protection included in the Trips Agreement have not been deemed immediately applicable under Argentine law. In addition, Argentina has not ratified or implemented other multilateral treaties on chip protection, in particular the Treaty of Washington of 1989.

Semiconductor technology, generally, and topographies, in particular, may be protected under the traditional intellectual property rules applicable to all types of technology, specially patent law and the rules on confidential information. Therefore, matters such as the duration of the relevant rights, ownership and remedies depend on the type of protection used in connection with each specific mask work or topography.

Circuit layouts are governed by the Circuit Layouts Act 1989 (Cth).

Semiconductor protection is governed by the Semiconductor Protection Act and ancillary ordinances as well as the EU Semiconductor Protection Directive and the TRIPS Agreement.

Protection of semiconductor topographies is governed by Title 8 (“Topographies of Semiconductor Products”) of Book XI (“Intellectual Property and Trade Secrets”) CEL.

Mask works are governed by Federal Law no. 11,484/07.

The Integrated Circuit Topography Act governs the protection of integrated circuit topographies.

LDs are protected by Law 19.039 on Industrial Property.

Regulations on Protection of Layout-Designs of Integrated Circuits and its Implementing Rules and Enforcement Rules are the main domestic legislations.

A layout-design of integrated circuits can also be protected under the Patent Law and the Regulations on Protection of Computer Software, where applicable.

China became a member of the Treaty on Intellectual Property in Respect of Integrated Circuits (Washington Treaty) in 1990.

Layout-designs of integrated circuits are governed by Decision 486 of 2000 issued by the CAN, which provides a sui generis protection for such rights. Furthermore, the Sole Circular issued by the Superintendency of Industry and Trade established some important guidelines regarding layout-designs of integrated circuits. Finally, Colombia is party to the Paris Convention for the Protection of Industrial Property and TRIPS agreement.

Mask works are governed by the Topographies of Semiconductor Products Act.

Semiconductor topographies are protected under the Protection of Topographies for Semiconductor Products Act (LBK 92 29/01/2019).

The Act on the Exclusive Right in the Layout-Design (Topography) of an Integrated Circuit governs topographies in general, and the Finnish Penal Code governs topography infringement crimes. The Act on the Protection of Semiconductor Topographies is based on the Topography Directive.

Semiconductor topographies are protected pursuant to Part VI of the French Intellectual Property Code (Articles L. 622-1 et seq. and R. 622-1 et seq.), which implements the European Directive 87/54/EEC of December 16, 1986 on the legal protection of topographies of semiconductor products.

Semiconductor topographies are protected pursuant to the German Act on the Protection of Topographies of Microelectronic Semiconductors (Halbleiterschutzgesetz).

Mask works are protected under the Layout-design (Topography) of Integrated Circuits Ordinance.

The underlying concepts of rights granted under the Layout-design (Topography) of Integrated Circuits Ordinance are broadly the same as those under the Copyright Ordinance.

Act No. 39 of 1991 on the Protection of Microelectronic Semiconductor Topographies. EU Council Directive 87/54/EC has been implemented.

Mask works are protected under Indian law under the SICLD as layout-design. India is also party to the Washington Treaty on Intellectual Property in Respect of Integrated Circuits (1989), although it is not yet enforced in India.

Law Number 32 of 2000 on Layout Designs of Integrated Circuits (Layout Design Law) is the governing statute.

The Irish European Communities (Protection of Topographies of Semiconductor Products) Regulations 1988 (as amended) gives effect to the Directive on the Legal Protection of Topographies of Semiconductor Products (87/54/EEC).

The Integrated Circuits (Protection) Law 1999 is the governing statute.

Sections 87 to 97 of the Industrial Property Code govern semiconductor topography protection.

The Act on the Circuit Layout of a Semiconductor Integrated Circuits (Act No. 43 of 1985) governs the protection of layout-designs of semiconductors.

The protection of semiconductor topographies is governed by the Law of December 29, 1988 on the Legal Protection of Topographies of Semiconductor Products.

Fifth Chapter of Second Title of the Federal Law for the Protection of Industrial Property (Ley Federal de Protección a la Propiedad Industrial) governs mask works.

Semiconductor topographies are protected pursuant to the Act of October 28, 1987 on the Legal Protection of Topographies of Semiconductor Products.

Layout designs are governed by the Layout Designs Act 1994.

Not applicable for this jurisdiction.

Mask works and topographies are governed by the Norwegian Integrated Circuits Act (kretsmønsterloven).

N/A

The IPC, as amended by Republic Act No. 9150 (entitled “An Act for the Protection of Layout-Designs (Topographies) of Integrated Circuits, Amending for the Purpose Certain Sections of Republic Act No. 8293, otherwise known as the Intellectual Property Code of the Philippines”), governs the protection of topographies of integrated circuits.

Topographies of integrated circuits are governed by the Industrial Property Law Act.

Mask works are governed by Title II, Chapter II of the Industrial Property Code (Articles 153 to 172).

Topographies of semiconductors are governed by Law no. 16 of March 6, 1995 on the protection of topographies of semiconductor products and are protected following their registration at the State Office for Inventions and Trademarks (SOIT).

Part IV of the Russian Civil Code governs the protection of semiconductor topographies.

The Law of Patents, Layout-Designs of Integrated Circuits, Plant Varieties, and Industrial Designs (promulgated by Royal Decree No. M/27 of 29/5/1425H (corresponding to July 17, 2004)), and its Implementing Regulations (Patents Law).

In Singapore, an original layout-design can be protected under the Layout-Designs of Integrated Circuits Act 1999.

The topography as the object of the legal protection is defined in the Slovak Act No. 146/2000 Coll. on Protection of Topographies of Semiconductor Products, as amended (Act on Topography). The Act on Topography provides protection to topography which is the result of the creative intellectual activity of the creator and which is not common in the semiconductor product industry. In order to obtain the protection of the owner of the topography, the creator shall submit the application for the registration of the topography to the Industrial Property Office.

In addition to Act on Topography, the Slovak Act No. 513/1991 Coll., the Commercial Code, as amended (Commercial Code) and the Civil Code shall apply as the general regulation.

Circuit layout-design protection is governed by the SCA.

Protection of semiconductor topographies is governed by Spanish Law 11/1988 on the Legal Protection of Topographies of Semiconductor Products.

Semiconductor topographies are protected under the Act on the Protection of Topographies for Semiconductor Products (1992:1685) (Lag om skydd för kretsmönster för halvledarprodukter).

Semiconductor topographies are protected pursuant to the Federal Act and Federal Ordinance on the Protection of Topographies of Semiconductor Products.

The Integrated Circuit Layout Protection Act was promulgated on August 11, 1995. The grant of a circuit layout right is based on registration with the Taiwan Intellectual Property Office, Ministry of Economic Affairs. No application for registration of a circuit layout will be accepted after 2 years from the date of the first commercial exploitation.

Rights to topographies are protected under the Law of Ukraine "On the Protection of Rights to Topographies of Semiconductor Products" dated November 5, 1997, which was substantially amended in 2019 in order to approximate topographies’ legal framework to EU regulation.

Not applicable.

Design Right (Semiconductor Topographies) Regulations 1989 (as amended) govern semiconductor topographies.

Mask works are protected under the US Semiconductor Chip Protection Act, which is administered by the Copyright Office but is different from copyright protection.